ProChem at ALD/ALE 2026: Supporting the Future of Atomic Layer Technologies

Last week, CEO Reno Novak and R&D Director Dr. Leonel Griego represented ProChem Inc. at ALD/ALE 2026 in Tampa, Florida, joining researchers and industry leaders focused on advancing atomic‑layer‑controlled deposition and etching.

The conference spotlighted innovations in precursor development, area‑selective deposition, selective ALE, emerging materials, and thin‑film solutions for semiconductors, energy storage, catalysis, and quantum devices. Across sessions, one message stood out: high‑purity, reliable materials are essential for enabling next‑generation ALD and ALE processes.

Key Topics from ALD/ALE 2026

• Next‑generation precursor design for advanced oxides, nitrides, and device architectures
• Area‑selective deposition and ALE for improved patterning and interface control
• Plasma‑enhanced and low‑temperature ALD for sensitive substrates
• ALD for batteries, catalysts, fuel cells, and energy systems
• Lab‑to‑fab scaling, digital twins, and manufacturing reliability

How ProChem’s Products Support These Advancements

High‑Purity Metal Salts & Inorganics:  ProChem’s rare earth, transition‑metal, alkali, and alkaline‑earth compounds serve as essential building blocks for new ALD and ALE precursor chemistries, where purity and consistency directly impact film performance.

Surface‑Active Compounds for ASD & ALE: Our catalog includes materials used for nucleation control, inhibitor layers, etch‑stop films, and hybrid ALD/MLD systems, supporting the industry’s growing focus on selective deposition and etching.

Materials for Energy & Advanced Devices:  ProChem supplies mixed‑metal oxides and thin‑film coating materials used in battery research, catalysis, fuel cells, and quantum technologies — all major themes at ALD/ALE 2026.

Custom Synthesis & Scalable Supply:  As ALD and ALE processes move toward manufacturing, ProChem provides lot‑to‑lot consistency, flexible packaging, and collaborative development with process engineers and equipment OEMs.

Looking Ahead

ALD/ALE 2026 reinforced the increasing need for high‑purity, application‑specific materials as device architectures evolve. ProChem remains committed to supporting researchers, fabs, and equipment manufacturers developing the next generation of atomic‑layer technologies.